Processed Ceramic Parts

SiC (High Purity Silicon Carbide)

SiC

SiC parts for semiconductor heat treatment we deal in are made of high purity silicon-impregnated silicon carbide.
They are particularly used in the preceding thermal treatment of semiconductor substrates where heat-resistant and high purity process is required.

Applications

Liner Tubes (Homogeneous thermal tubes for semiconductor heat treatment furnaces)
Process Tubes (Reaction tubes for semiconductor heat treatment furnaces)
Boats (Wafer holding jigs for semiconductor heat treatment furnaces)
Other parts

Available Configurations

Complicated configurations as well as tubes with diameter ranging from 8 mm to 500 mm are available

Impurity Contents

Impurity
Elements
Fe Ni Na K Mg Ca Cr mn Zn Cu Ti V Al
Typical
Content
[ppm]
2~4 <2 <0.5 <1.5 <0.1 5 0.3 <0.1 <0.1 <0.1 <3 <3 25
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Processed Ceramic Parts

A2IO3(Almina content: 99.5%)

ceramic2

SiC parts for semiconductor heat treatment we deal in are made of high purity silicon-impregnated silicon carbide.
They are particularly used in the preceding thermal treatment of semiconductor substrates where heat-resistant and high purity process is required.

Applications

Parts for semiconductor and liquid crystal production equipment
(Plasma CVD Equipment, Plasma Etching Equipment, Iron Injection Equipment, Sputtering Equipment)
Parts for wafer manufacturing equipment
(CMP machines, Lapping machines, Polishing machines, Beveling machines, etc.)
Measuring devices, Tools, Jigs, Parts for machine tools

Available Configurations

ceramic3

Flat plate: up to 2,500 x 1,000 mm
Square plate: up to 1,400 x 1,400 mm
Long plate: up to 2,600 mm
Disk: up to 1,400 mm in diameter